Kinetic limit of segregation during the molecular beam epitaxy of GaAs/AlAs heterostructures (1997)
- Authors:
- Autor USP: BASMAJI, PIERRE - IFSC
- Unidade: IFSC
- Subjects: MATÉRIA CONDENSADA; MATÉRIA CONDENSADA
- Language: Inglês
- Imprenta:
- Publisher: University of Nebraska
- Publisher place: Lincoln
- Date published: 1997
- Conference titles: International Conference on Superlattices, Microructures, and Microdevices
-
ABNT
ZANELATTO, G et al. Kinetic limit of segregation during the molecular beam epitaxy of GaAs/AlAs heterostructures. 1997, Anais.. Lincoln: University of Nebraska, 1997. . Acesso em: 21 maio 2024. -
APA
Zanelatto, G., Pusep, Y. A., Lubyshev, D. I., Galzerani, J. C., & Basmaji, P. (1997). Kinetic limit of segregation during the molecular beam epitaxy of GaAs/AlAs heterostructures. In . Lincoln: University of Nebraska. -
NLM
Zanelatto G, Pusep YA, Lubyshev DI, Galzerani JC, Basmaji P. Kinetic limit of segregation during the molecular beam epitaxy of GaAs/AlAs heterostructures. 1997 ;[citado 2024 maio 21 ] -
Vancouver
Zanelatto G, Pusep YA, Lubyshev DI, Galzerani JC, Basmaji P. Kinetic limit of segregation during the molecular beam epitaxy of GaAs/AlAs heterostructures. 1997 ;[citado 2024 maio 21 ] - Heteroestruturas 'AL''GA''AS' / 'GA''AS' com mobilidade 390 x'10 POT.3''CENTIMETROS QUADRADOS' / v.S crescidas por mbe
- 'IN''AS' wire crystals grown by molecular beam epitaxy on porous 'SI'
- Centro dx em estruturas 'AL IND.X''GA IND.1-X''AS' altamente dopada com selenio
- Centro dx em 'AL IND.X''GA IND.1-X''AS': 'SE'
- Medidas de fotoreflectancia em 'DELTA'-doping
- Photoreflectance of 2-d electron gas: observation of quantum franz-keldysh effect?
- Selenium-dx center-doped 'AL IND.X''GA IND.1-X''AS' grown by molecular beam epitaxy
- Espectroscopia de tunelamento em sistemas delta-doping
- Optical and structural properties of low temperature 'GA''AS' layers grown by molecular beam epitaxy
- Magnetic-field-tuned impurity level in a mesoscopic 'AL IND.X''GA IND.1-X''AS' / 'GA''AS' antidot sample
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