Full complex amplitude modulation proximity printing mask fabricated on DLC and 'SI''O IND.2' subtrates (2002)
- Authors:
- USP affiliated authors: GONCALVES NETO, LUIZ - EESC ; VERDONCK, PATRICK BERNARD - EP
- Unidades: EESC; EP
- Subjects: ÓPTICA ELETRÔNICA; MICROELETRÔNICA
- Language: Inglês
- Imprenta:
- Publisher: Optical Society of America
- Publisher place: Tucson
- Date published: 2002
- Conference titles: Diffractive Optics and Micro-Optics
-
ABNT
GONÇALVES NETO, Luis et al. Full complex amplitude modulation proximity printing mask fabricated on DLC and 'SI''O IND.2' subtrates. 2002, Anais.. Tucson: Optical Society of America, 2002. . Acesso em: 01 maio 2024. -
APA
Gonçalves Neto, L., Cirino, G. A., Mansano, R. D., Cardona, P. S. P., & Verdonck, P. B. (2002). Full complex amplitude modulation proximity printing mask fabricated on DLC and 'SI''O IND.2' subtrates. In . Tucson: Optical Society of America. -
NLM
Gonçalves Neto L, Cirino GA, Mansano RD, Cardona PSP, Verdonck PB. Full complex amplitude modulation proximity printing mask fabricated on DLC and 'SI''O IND.2' subtrates. 2002 ;[citado 2024 maio 01 ] -
Vancouver
Gonçalves Neto L, Cirino GA, Mansano RD, Cardona PSP, Verdonck PB. Full complex amplitude modulation proximity printing mask fabricated on DLC and 'SI''O IND.2' subtrates. 2002 ;[citado 2024 maio 01 ] - Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle
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