Fluorine containing plasma etching surface chemical characterization by coulometric reduction (2003)
- Authors:
- USP affiliated authors: VERDONCK, PATRICK BERNARD - EP ; AOKI, IDALINA VIEIRA - EP
- Unidade: EP
- Subjects: COBRE; CORROSÃO ATMOSFÉRICA; CORROSÃO DOS MATERIAIS; ELETROQUÍMICA; INIBIDORES DE CORROSÃO; METAIS (CONSERVAÇÃO); MICROSCOPIA ELETRÔNICA
- Language: Inglês
- Imprenta:
- Source:
- Título do periódico: 54 th ISE Meeting book of abstracts.
- Conference titles: Meeting of the International Society of Electrochemistry
-
ABNT
VILCA-MELENDEZ, Hugo Antonio et al. Fluorine containing plasma etching surface chemical characterization by coulometric reduction. 2003, Anais.. São Pedro: Escola Politécnica, Universidade de São Paulo, 2003. . Acesso em: 21 maio 2024. -
APA
Vilca-Melendez, H. A., Ruas, R., Verdonck, P. B., & Aoki, I. V. (2003). Fluorine containing plasma etching surface chemical characterization by coulometric reduction. In 54 th ISE Meeting book of abstracts.. São Pedro: Escola Politécnica, Universidade de São Paulo. -
NLM
Vilca-Melendez HA, Ruas R, Verdonck PB, Aoki IV. Fluorine containing plasma etching surface chemical characterization by coulometric reduction. 54 th ISE Meeting book of abstracts. 2003 ;[citado 2024 maio 21 ] -
Vancouver
Vilca-Melendez HA, Ruas R, Verdonck PB, Aoki IV. Fluorine containing plasma etching surface chemical characterization by coulometric reduction. 54 th ISE Meeting book of abstracts. 2003 ;[citado 2024 maio 21 ] - Characterization by coulometric reduction of surface chemical components formed on copper in fluorine-containing plasmas
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