Comparing analysis of nano-resistive films with nuclear and atomic techniques (2005)
- Authors:
- USP affiliated authors: RIZZUTTO, MARCIA DE ALMEIDA - IF ; TABACNIKS, MANFREDO HARRI - IF ; ADDED, NEMITALA - IF
- Unidade: IF
- Assunto: FÍSICA NUCLEAR
- Language: Inglês
- Imprenta:
- Source:
- Título do periódico: Programa
- Volume/Número/Paginação/Ano: São Paulo : SBF, 2005
- Conference titles: Reunião de Trabalho sobre Física Nuclear no Brasil
-
ABNT
CARMIGNOTTO, Marco Antonio Pannunzio et al. Comparing analysis of nano-resistive films with nuclear and atomic techniques. 2005, Anais.. São Paulo: SBF, 2005. . Acesso em: 23 maio 2024. -
APA
Carmignotto, M. A. P., Rizzutto, M. de A., Lima, A. R., Delgado, A. de O., Santos, P. R. dos, Tabacniks, M. H., & Added, N. (2005). Comparing analysis of nano-resistive films with nuclear and atomic techniques. In Programa. São Paulo: SBF. -
NLM
Carmignotto MAP, Rizzutto M de A, Lima AR, Delgado A de O, Santos PR dos, Tabacniks MH, Added N. Comparing analysis of nano-resistive films with nuclear and atomic techniques. Programa. 2005 ;[citado 2024 maio 23 ] -
Vancouver
Carmignotto MAP, Rizzutto M de A, Lima AR, Delgado A de O, Santos PR dos, Tabacniks MH, Added N. Comparing analysis of nano-resistive films with nuclear and atomic techniques. Programa. 2005 ;[citado 2024 maio 23 ] - X-ray production yield in standardized thick target PIXE
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