Accessing 3D dimension on a wedding cake like SEBS block copolymer droplet (2009)
- Authors:
- USP affiliated authors: SILVA, MARCELO DE ASSUMPCAO PEREIRA DA - IFSC ; FARIA, ROBERTO MENDONÇA - IFSC
- Unidade: IFSC
- Subjects: POLÍMEROS (MATERIAIS) (ESTRUTURA); PROPRIEDADES DOS MATERIAIS; FILMES FINOS
- Language: Inglês
- Imprenta:
- Publisher: International Union of Materials Research Societies - IUMRS
- Publisher place: Evanston
- Date published: 2009
- Source:
- Título do periódico: Abstracts
- Conference titles: International Conference on Advanced Materials - ICAM
-
ABNT
SILVA, Marcelo de Assumpção Pereira da et al. Accessing 3D dimension on a wedding cake like SEBS block copolymer droplet. 2009, Anais.. Evanston: International Union of Materials Research Societies - IUMRS, 2009. . Acesso em: 18 maio 2024. -
APA
Silva, M. de A. P. da, Carvalho, A. J. F., Magalhães, D. P., & Faria, R. M. (2009). Accessing 3D dimension on a wedding cake like SEBS block copolymer droplet. In Abstracts. Evanston: International Union of Materials Research Societies - IUMRS. -
NLM
Silva M de AP da, Carvalho AJF, Magalhães DP, Faria RM. Accessing 3D dimension on a wedding cake like SEBS block copolymer droplet. Abstracts. 2009 ;[citado 2024 maio 18 ] -
Vancouver
Silva M de AP da, Carvalho AJF, Magalhães DP, Faria RM. Accessing 3D dimension on a wedding cake like SEBS block copolymer droplet. Abstracts. 2009 ;[citado 2024 maio 18 ] - Soft lithography in ordered-desordered nanostructures of triblock copolymer
- Dewetting of polymer thin films applied to polymeric ligh emitting devices
- Modeling of SEBS structures during pattern dynamic formation
- Ammonium free self-assembly deposition of CdS luminescent quantum dots on flexible-transparent substrate
- Surface energy characterization of light-emitting diodes by Atomic Force Microscopy (AFM): contact angle and surface energy determination
- Estudo de estruturas submicrometricas auto-organizadas de copolimeros
- Morphological characterization of PPV multilayer by AFM technique
- Estruturas de copolímeros sub-micrometricas utilizadas em processo de litografia
- Soft-lithography usando copolímero tribloco
- Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation
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