Modeling of SEBS structures during pattern dynamic formation (2010)
- Authors:
- USP affiliated authors: SILVA, MARCELO DE ASSUMPCAO PEREIRA DA - IFSC ; FARIA, ROBERTO MENDONÇA - IFSC
- Unidade: IFSC
- Subjects: FILMES FINOS; POLÍMEROS (MATERIAIS)
- Language: Inglês
- Imprenta:
- Publisher: Materials Research Society - MRS
- Publisher place: Warrendale
- Date published: 2010
- Source:
- Título do periódico: Abstracts
- Conference titles: MRS Fall Meeting
-
ABNT
BIANCHI, Andrea G. et al. Modeling of SEBS structures during pattern dynamic formation. 2010, Anais.. Warrendale: Materials Research Society - MRS, 2010. . Acesso em: 21 maio 2024. -
APA
Bianchi, A. G., Salvador, M. A., Carvalho, A. F., Silva, M. de A. P. da, & Faria, R. M. (2010). Modeling of SEBS structures during pattern dynamic formation. In Abstracts. Warrendale: Materials Research Society - MRS. -
NLM
Bianchi AG, Salvador MA, Carvalho AF, Silva M de AP da, Faria RM. Modeling of SEBS structures during pattern dynamic formation. Abstracts. 2010 ;[citado 2024 maio 21 ] -
Vancouver
Bianchi AG, Salvador MA, Carvalho AF, Silva M de AP da, Faria RM. Modeling of SEBS structures during pattern dynamic formation. Abstracts. 2010 ;[citado 2024 maio 21 ] - Soft lithography in ordered-desordered nanostructures of triblock copolymer
- Dewetting of polymer thin films applied to polymeric ligh emitting devices
- Ammonium free self-assembly deposition of CdS luminescent quantum dots on flexible-transparent substrate
- Surface energy characterization of light-emitting diodes by Atomic Force Microscopy (AFM): contact angle and surface energy determination
- Estudo de estruturas submicrometricas auto-organizadas de copolimeros
- Morphological characterization of PPV multilayer by AFM technique
- Accessing 3D dimension on a wedding cake like SEBS block copolymer droplet
- Estruturas de copolímeros sub-micrometricas utilizadas em processo de litografia
- Soft-lithography usando copolímero tribloco
- Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation
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