Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation (2005)
- Authors:
- USP affiliated authors: SILVA, MARCELO DE ASSUMPCAO PEREIRA DA - IFSC ; FARIA, ROBERTO MENDONÇA - IFSC
- Unidade: IFSC
- DOI: 10.1109/ISE.2005.1612329
- Subjects: POLÍMEROS (MATERIAIS); MATERIAIS NANOESTRUTURADOS
- Language: Inglês
- Imprenta:
- Publisher: Institute of Electrical and Electronics Engineers - IEEE
- Publisher place: Piscataway
- Date published: 2005
- Source:
- Título do periódico: Proceedings
- Conference titles: International Symposium on Electrets - ISE
- Este periódico é de assinatura
- Este artigo NÃO é de acesso aberto
- Cor do Acesso Aberto: closed
-
ABNT
CARVALHO, A. J. F. e SILVA, Marcelo de Assumpção Pereira da e FARIA, Roberto Mendonça. Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation. 2005, Anais.. Piscataway: Institute of Electrical and Electronics Engineers - IEEE, 2005. Disponível em: https://doi.org/10.1109/ISE.2005.1612329. Acesso em: 20 maio 2024. -
APA
Carvalho, A. J. F., Silva, M. de A. P. da, & Faria, R. M. (2005). Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation. In Proceedings. Piscataway: Institute of Electrical and Electronics Engineers - IEEE. doi:10.1109/ISE.2005.1612329 -
NLM
Carvalho AJF, Silva M de AP da, Faria RM. Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation [Internet]. Proceedings. 2005 ;[citado 2024 maio 20 ] Available from: https://doi.org/10.1109/ISE.2005.1612329 -
Vancouver
Carvalho AJF, Silva M de AP da, Faria RM. Fabrication of mesoscopic block copolymer regular structures by dewetting and phase separation [Internet]. Proceedings. 2005 ;[citado 2024 maio 20 ] Available from: https://doi.org/10.1109/ISE.2005.1612329 - Soft lithography in ordered-desordered nanostructures of triblock copolymer
- Dewetting of polymer thin films applied to polymeric ligh emitting devices
- Modeling of SEBS structures during pattern dynamic formation
- Ammonium free self-assembly deposition of CdS luminescent quantum dots on flexible-transparent substrate
- Surface energy characterization of light-emitting diodes by Atomic Force Microscopy (AFM): contact angle and surface energy determination
- Estudo de estruturas submicrometricas auto-organizadas de copolimeros
- Morphological characterization of PPV multilayer by AFM technique
- Accessing 3D dimension on a wedding cake like SEBS block copolymer droplet
- Estruturas de copolímeros sub-micrometricas utilizadas em processo de litografia
- Soft-lithography usando copolímero tribloco
Informações sobre o DOI: 10.1109/ISE.2005.1612329 (Fonte: oaDOI API)
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