Hydrogenated amorphous silicon films by 60 hz glow-discharge deposition (1993)
Source: Journal of Applied Physics. Unidade: IFSC
Subjects: CIRCUITOS ELETRÔNICOS, MATÉRIA CONDENSADA
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FRAGALLI, J F et al. Hydrogenated amorphous silicon films by 60 hz glow-discharge deposition. Journal of Applied Physics, v. 74, n. 1 , p. 668-71, 1993Tradução . . Disponível em: https://doi.org/10.1063/1.355228. Acesso em: 01 jun. 2024.APA
Fragalli, J. F., Misoguti, L., Nakagaito, A. N., Grivickas, V., Bagnato, V. S., & Branz, H. M. (1993). Hydrogenated amorphous silicon films by 60 hz glow-discharge deposition. Journal of Applied Physics, 74( 1 ), 668-71. doi:10.1063/1.355228NLM
Fragalli JF, Misoguti L, Nakagaito AN, Grivickas V, Bagnato VS, Branz HM. Hydrogenated amorphous silicon films by 60 hz glow-discharge deposition [Internet]. Journal of Applied Physics. 1993 ;74( 1 ): 668-71.[citado 2024 jun. 01 ] Available from: https://doi.org/10.1063/1.355228Vancouver
Fragalli JF, Misoguti L, Nakagaito AN, Grivickas V, Bagnato VS, Branz HM. Hydrogenated amorphous silicon films by 60 hz glow-discharge deposition [Internet]. Journal of Applied Physics. 1993 ;74( 1 ): 668-71.[citado 2024 jun. 01 ] Available from: https://doi.org/10.1063/1.355228
