Application of fluorine based plasma etching processes in microfluidic device fabrication (2000)
- Autores:
- Autores USP: VERDONCK, PATRICK BERNARD - EP ; FURLAN, ROGERIO - EP ; MANSANO, RONALDO DOMINGUES - EP
- Unidade: EP
- Assunto: CIRCUITOS ELETRÔNICOS
- Idioma: Inglês
- Imprenta:
- Fonte:
- Título do periódico: Journal of Solid-State Devices and Circuits
- Volume/Número/Paginação/Ano: v. 8, n. 1, p. 5-9, feb. 2000
-
ABNT
MANSANO, Ronaldo Domingues et al. Application of fluorine based plasma etching processes in microfluidic device fabrication. Journal of Solid-State Devices and Circuits, v. 8, n. 1, p. 5-9, 2000Tradução . . Acesso em: 24 abr. 2024. -
APA
Mansano, R. D., Verdonck, P. B., Simões, E. W., & Furlan, R. (2000). Application of fluorine based plasma etching processes in microfluidic device fabrication. Journal of Solid-State Devices and Circuits, 8( 1), 5-9. -
NLM
Mansano RD, Verdonck PB, Simões EW, Furlan R. Application of fluorine based plasma etching processes in microfluidic device fabrication. Journal of Solid-State Devices and Circuits. 2000 ; 8( 1): 5-9.[citado 2024 abr. 24 ] -
Vancouver
Mansano RD, Verdonck PB, Simões EW, Furlan R. Application of fluorine based plasma etching processes in microfluidic device fabrication. Journal of Solid-State Devices and Circuits. 2000 ; 8( 1): 5-9.[citado 2024 abr. 24 ] - Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes
- LPCVD deposition of silicon nitride assisted by high density plasmas
- Diamond like-carbon microoptics elements
- Obtenção de filmes de nitreto de silício por deposição química assistida por plasma acoplado indutivamente
- Deposition of silicon nitride films by LPCVD assisted by high density plasma
- Silicon nitride coupled plasma deposited from mixtures of silane - nitrogen and silane - ammonia
- Fabrication of silicon probes for biosensors
- Characteristics of silicon nitride films deposited by inductively coulped plasma CVD
- High-density plasma chemical vapor deposition of amorphous carbon films
- Complex-amplitude modulation diffractive optical element performed by aperture variations on a reflective aluminium layer deposited over a variable thickness SiC2 substrate
Como citar
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
