High density plasma chemical deposition of amorphous carbon films (2003)
- Authors:
- Autor USP: MANSANO, RONALDO DOMINGUES - EP
- Unidade: EP
- Assunto: PLASMA (MICROELETRÔNICA)
- Language: Inglês
- Imprenta:
- Source:
- Título do periódico: Program and Abstracts.
- Conference titles: Brazilian Meeting on Plasma Physics
-
ABNT
MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues. High density plasma chemical deposition of amorphous carbon films. 2003, Anais.. São Paulo: SBF, 2003. . Acesso em: 24 abr. 2024. -
APA
Mousinho, A. P., & Mansano, R. D. (2003). High density plasma chemical deposition of amorphous carbon films. In Program and Abstracts.. São Paulo: SBF. -
NLM
Mousinho AP, Mansano RD. High density plasma chemical deposition of amorphous carbon films. Program and Abstracts. 2003 ;[citado 2024 abr. 24 ] -
Vancouver
Mousinho AP, Mansano RD. High density plasma chemical deposition of amorphous carbon films. Program and Abstracts. 2003 ;[citado 2024 abr. 24 ] - Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering
- Estudo e desenvolvimento de processos de deposição por plasma de filmes de carbono amorfo hidrogenado (Diamond Like Carbon - DLC)
- High density plasma chemical vapor deposition of diamond-like carbon films
- Ion implantation in titanium dioxide thin films studied by perturbed angular correlations
- Implantation of cobalt in SnO2 thin films studied by TDPAC
- Low Pressure Plasma Study for Platinum Nanoparticles Synthesis
- Influence of the fluorine addition on the electric characteristics of DLC films deposited by high density plasma chemical vapor deposition
- Elementos em microóptica fabricados com filmes de carbono tipo diamante (DLC)
- Silicon nitride deposited by inductively coupled plasma using dichlorosilane and ammonia
- Diffractive optical elements based in brand glass
How to cite
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
