Isotropic etching of deep trenches in silicon (1996)
- Authors:
- USP affiliated authors: MACIEL, HOMERO SANTIAGO - EP ; VERDONCK, PATRICK BERNARD - EP
- Unidade: EP
- Assunto: SEMICONDUTORES
- Language: Inglês
- Imprenta:
- Source:
- Título do periódico: Proceedings
- Conference titles: Conference on the Brazilian Microelectronics Society
-
ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, H. S. Isotropic etching of deep trenches in silicon. 1996, Anais.. São Paulo: Sbmicro, 1996. . Acesso em: 24 abr. 2024. -
APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1996). Isotropic etching of deep trenches in silicon. In Proceedings. São Paulo: Sbmicro. -
NLM
Mansano RD, Verdonck PB, Maciel HS. Isotropic etching of deep trenches in silicon. Proceedings. 1996 ;[citado 2024 abr. 24 ] -
Vancouver
Mansano RD, Verdonck PB, Maciel HS. Isotropic etching of deep trenches in silicon. Proceedings. 1996 ;[citado 2024 abr. 24 ] - Obtencao de um processo de litografia de multicamadas
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