Effects of Si'H IND.2''Cl IND.2' on the deposition and properties of amorphous and microcrystalline silicon fabricated from very high frequency glow discharges (2000)
- Authors:
- Autor USP: ZANATTA, ANTONIO RICARDO - IFSC
- Unidade: IFSC
- Assunto: MATÉRIA CONDENSADA
- Language: Inglês
- Imprenta:
- Publisher place: Pennington
- Date published: 2000
- Source:
- Título do periódico: Journal of the Electrochemical Society
- ISSN: 0013-4651
- Volume/Número/Paginação/Ano: v. 147, n. 5, p. 1829-1834, 2000
-
ABNT
MULATO, M. e WAGNER, S. e ZANATTA, Antonio Ricardo. Effects of Si'H IND.2''Cl IND.2' on the deposition and properties of amorphous and microcrystalline silicon fabricated from very high frequency glow discharges. Journal of the Electrochemical Society, v. 147, n. 5, p. 1829-1834, 2000Tradução . . Acesso em: 19 abr. 2024. -
APA
Mulato, M., Wagner, S., & Zanatta, A. R. (2000). Effects of Si'H IND.2''Cl IND.2' on the deposition and properties of amorphous and microcrystalline silicon fabricated from very high frequency glow discharges. Journal of the Electrochemical Society, 147( 5), 1829-1834. -
NLM
Mulato M, Wagner S, Zanatta AR. Effects of Si'H IND.2''Cl IND.2' on the deposition and properties of amorphous and microcrystalline silicon fabricated from very high frequency glow discharges. Journal of the Electrochemical Society. 2000 ; 147( 5): 1829-1834.[citado 2024 abr. 19 ] -
Vancouver
Mulato M, Wagner S, Zanatta AR. Effects of Si'H IND.2''Cl IND.2' on the deposition and properties of amorphous and microcrystalline silicon fabricated from very high frequency glow discharges. Journal of the Electrochemical Society. 2000 ; 147( 5): 1829-1834.[citado 2024 abr. 19 ] - Structural investigation of cobalt oxide films grown by reactive DC magnetron sputtering
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