Structural properties of aluminum - nitrogen films prepared at low temperature (2002)
- Authors:
- Autor USP: ZANATTA, ANTONIO RICARDO - IFSC
- Unidade: IFSC
- DOI: 10.1063/1.1498002
- Assunto: FÍSICA DA MATÉRIA CONDENSADA
- Language: Inglês
- Imprenta:
- Publisher place: College Park
- Date published: 2002
- Source:
- Título do periódico: Applied Physics Letters
- ISSN: 0003-6951
- Volume/Número/Paginação/Ano: v.81, n.6, p.1005-1007, Aug. 2002
- Este periódico é de assinatura
- Este artigo NÃO é de acesso aberto
- Cor do Acesso Aberto: closed
-
ABNT
RIBEIRO, C. T. M. e ALVAREZ, F. e ZANATTA, Antonio Ricardo. Structural properties of aluminum - nitrogen films prepared at low temperature. Applied Physics Letters, v. 81, n. 6, p. 1005-1007, 2002Tradução . . Disponível em: https://doi.org/10.1063/1.1498002. Acesso em: 24 abr. 2024. -
APA
Ribeiro, C. T. M., Alvarez, F., & Zanatta, A. R. (2002). Structural properties of aluminum - nitrogen films prepared at low temperature. Applied Physics Letters, 81( 6), 1005-1007. doi:10.1063/1.1498002 -
NLM
Ribeiro CTM, Alvarez F, Zanatta AR. Structural properties of aluminum - nitrogen films prepared at low temperature [Internet]. Applied Physics Letters. 2002 ;81( 6): 1005-1007.[citado 2024 abr. 24 ] Available from: https://doi.org/10.1063/1.1498002 -
Vancouver
Ribeiro CTM, Alvarez F, Zanatta AR. Structural properties of aluminum - nitrogen films prepared at low temperature [Internet]. Applied Physics Letters. 2002 ;81( 6): 1005-1007.[citado 2024 abr. 24 ] Available from: https://doi.org/10.1063/1.1498002 - Structural investigation of cobalt oxide films grown by reactive DC magnetron sputtering
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Informações sobre o DOI: 10.1063/1.1498002 (Fonte: oaDOI API)
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