Comment on "Ion-assisted pulsed laser deposition of aluminum nitride thin films" [J. Appl. Phys. 87 1540 (2000)] (2002)
- Authors:
- Autor USP: ZANATTA, ANTONIO RICARDO - IFSC
- Unidade: IFSC
- Subjects: FILMES FINOS; FÍSICA DA MATÉRIA CONDENSADA
- Language: Inglês
- Imprenta:
- Source:
- Título do periódico: Journal of Applied Physics
- ISSN: 0021-8979
- Volume/Número/Paginação/Ano: v.92, n.10, p.6349-6350, Nov,2002
-
ABNT
ZANATTA, Antonio Ricardo e RIBEIRO, C T M e ALVAREZ, F. Comment on "Ion-assisted pulsed laser deposition of aluminum nitride thin films" [J. Appl. Phys. 87 1540 (2000)]. Journal of Applied Physics. New York: Instituto de Física de São Carlos, Universidade de São Paulo. . Acesso em: 18 abr. 2024. , 2002 -
APA
Zanatta, A. R., Ribeiro, C. T. M., & Alvarez, F. (2002). Comment on "Ion-assisted pulsed laser deposition of aluminum nitride thin films" [J. Appl. Phys. 87 1540 (2000)]. Journal of Applied Physics. New York: Instituto de Física de São Carlos, Universidade de São Paulo. -
NLM
Zanatta AR, Ribeiro CTM, Alvarez F. Comment on "Ion-assisted pulsed laser deposition of aluminum nitride thin films" [J. Appl. Phys. 87 1540 (2000)]. Journal of Applied Physics. 2002 ;92( 10): 6349-6350.[citado 2024 abr. 18 ] -
Vancouver
Zanatta AR, Ribeiro CTM, Alvarez F. Comment on "Ion-assisted pulsed laser deposition of aluminum nitride thin films" [J. Appl. Phys. 87 1540 (2000)]. Journal of Applied Physics. 2002 ;92( 10): 6349-6350.[citado 2024 abr. 18 ] - Structural investigation of cobalt oxide films grown by reactive DC magnetron sputtering
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