Full complex amplitude digital holograms: design, fabrication and optical characterization (2004)
- Authors:
- USP affiliated authors: GONCALVES NETO, LUIZ - EESC ; MANSANO, RONALDO DOMINGUES - EP ; VERDONCK, PATRICK BERNARD - EP
- Unidades: EESC; EP
- Subjects: ÓPTICA ELETRÔNICA; HOLOGRAFIA DIGITAL
- Language: Inglês
- Imprenta:
- Source:
- Título do periódico: OME Information
- ISSN: 1007-1180
- Volume/Número/Paginação/Ano: n. 7, p. 15-25, July 2004
-
ABNT
GONÇALVES NETO, Luiz et al. Full complex amplitude digital holograms: design, fabrication and optical characterization. OME Information, n. 7, p. 15-25, 2004Tradução . . Acesso em: 16 abr. 2024. -
APA
Gonçalves Neto, L., Cardona, P. S. P., Cirino, G. A., Mansano, R. D., & Verdonck, P. B. (2004). Full complex amplitude digital holograms: design, fabrication and optical characterization. OME Information, ( 7), 15-25. -
NLM
Gonçalves Neto L, Cardona PSP, Cirino GA, Mansano RD, Verdonck PB. Full complex amplitude digital holograms: design, fabrication and optical characterization. OME Information. 2004 ;( 7): 15-25.[citado 2024 abr. 16 ] -
Vancouver
Gonçalves Neto L, Cardona PSP, Cirino GA, Mansano RD, Verdonck PB. Full complex amplitude digital holograms: design, fabrication and optical characterization. OME Information. 2004 ;( 7): 15-25.[citado 2024 abr. 16 ] - Fabrication of PMMA microlenses using a micromachined silicon moud
- Implementation of Fresnel full complex-amplitude digital holograms
- Hybrid phase and amplitude modulation proximity printing mask fabricated on DLC and 'SIO IND. 2' substrates
- Design, fabrication, and characterization of a full complex-amplitude modulation diffractive optical element
- Full complex amplitude modulation proximity printing mask fabricated on DLC and 'SI''O IND.2' subtrates
- Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution
- Digital holography: computer-generated holograms and diffractive optics in scalar diffraction domain
- Diffractive phase-shift lithography photomask operating in proximity printing mode
- Diffractive optical element applied to proximity exposure lithography exploring partial light coherence
- Low-cost Fresnel microlens array fabricated by a home-built maskless lithography system
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