Amorphous carbon nitride (a-CNx) thin films deposited by ECR plasma reactor (2005)
- Authors:
- USP affiliated authors: FANTINI, MARCIA CARVALHO DE ABREU - IF ; GALVAO, RICARDO MAGNUS OSORIO - IF
- Unidade: IF
- Subjects: FÍSICA DE PLASMAS; TOKAMAKS
- Language: Inglês
- Imprenta:
- Source:
- Título do periódico: Resumos
- Conference titles: Encontro Brasileiro de Física dos Plasmas
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ABNT
MATTA, J A S da e FANTINI, Márcia Carvalho de Abreu e GALVAO, Ricardo Magnus Osorio. Amorphous carbon nitride (a-CNx) thin films deposited by ECR plasma reactor. 2005, Anais.. São Paulo: SBF, 2005. Disponível em: http://www.sbf1.sbfisica.org.br/eventos/ebfp/8/sys/resumos/R0099-1.pdf. Acesso em: 25 abr. 2024. -
APA
Matta, J. A. S. da, Fantini, M. C. de A., & Galvao, R. M. O. (2005). Amorphous carbon nitride (a-CNx) thin films deposited by ECR plasma reactor. In Resumos. São Paulo: SBF. Recuperado de http://www.sbf1.sbfisica.org.br/eventos/ebfp/8/sys/resumos/R0099-1.pdf -
NLM
Matta JAS da, Fantini MC de A, Galvao RMO. Amorphous carbon nitride (a-CNx) thin films deposited by ECR plasma reactor [Internet]. Resumos. 2005 ;[citado 2024 abr. 25 ] Available from: http://www.sbf1.sbfisica.org.br/eventos/ebfp/8/sys/resumos/R0099-1.pdf -
Vancouver
Matta JAS da, Fantini MC de A, Galvao RMO. Amorphous carbon nitride (a-CNx) thin films deposited by ECR plasma reactor [Internet]. Resumos. 2005 ;[citado 2024 abr. 25 ] Available from: http://www.sbf1.sbfisica.org.br/eventos/ebfp/8/sys/resumos/R0099-1.pdf - Description and characterization of a ECR plasma device developed for thin film deposition
- Description and characterization of a ECR plasma device developed for thin film deposition
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