Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering (2007)
- Authors:
- Autor USP: MANSANO, RONALDO DOMINGUES - EP
- Unidade: EP
- Subjects: MICROELETRÔNICA; FILMES FINOS
- Language: Inglês
- Imprenta:
- Publisher: The Electrochemical Society
- Publisher place: Pennington
- Date published: 2007
- Source:
- Título do periódico: SBMicro 2007
- ISSN: 1938-5862
- Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO
-
ABNT
DAMIANI, Larissa Rodrigues e MANSANO, Ronaldo Domingues. Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering. 2007, Anais.. Pennington: The Electrochemical Society, 2007. . Acesso em: 19 abr. 2024. -
APA
Damiani, L. R., & Mansano, R. D. (2007). Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering. In SBMicro 2007. Pennington: The Electrochemical Society. -
NLM
Damiani LR, Mansano RD. Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering. SBMicro 2007. 2007 ;[citado 2024 abr. 19 ] -
Vancouver
Damiani LR, Mansano RD. Deposition and characterization of indium-tin oxide thin films deposited by RF sputtering. SBMicro 2007. 2007 ;[citado 2024 abr. 19 ] - Estudo e desenvolvimento de processos de deposição por plasma de filmes de carbono amorfo hidrogenado (Diamond Like Carbon - DLC)
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