Study of nickel silicide as mask for alkaline solutions to V-grooves fabrication (2007)
- Authors:
- Autor USP: MORIMOTO, NILTON ITIRO - EP
- Unidade: EP
- Assunto: MICROELETRÔNICA
- Language: Inglês
- Imprenta:
- Publisher: The Electrochemical Society
- Publisher place: Pennington
- Date published: 2007
- Source:
- Título do periódico: SBMicro 2007
- ISSN: 1938-5862
- Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO
-
ABNT
MASCARO, Amanda Rossi e GONÇALVES, Lucas Gonçalves Dias e MORIMOTO, Nilton Itiro. Study of nickel silicide as mask for alkaline solutions to V-grooves fabrication. 2007, Anais.. Pennington: The Electrochemical Society, 2007. . Acesso em: 19 abr. 2024. -
APA
Mascaro, A. R., Gonçalves, L. G. D., & Morimoto, N. I. (2007). Study of nickel silicide as mask for alkaline solutions to V-grooves fabrication. In SBMicro 2007. Pennington: The Electrochemical Society. -
NLM
Mascaro AR, Gonçalves LGD, Morimoto NI. Study of nickel silicide as mask for alkaline solutions to V-grooves fabrication. SBMicro 2007. 2007 ;[citado 2024 abr. 19 ] -
Vancouver
Mascaro AR, Gonçalves LGD, Morimoto NI. Study of nickel silicide as mask for alkaline solutions to V-grooves fabrication. SBMicro 2007. 2007 ;[citado 2024 abr. 19 ] - Method to obtain TEOS PECVD silicon oxide thick layers for optoelectronics devices applications. (em CD-Rom)
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