Diffractive phase-shift lithography photomask operating in proximity printing mode (2010)
- Authors:
- USP affiliated authors: MANSANO, RONALDO DOMINGUES - EP ; GONCALVES NETO, LUIZ - EESC
- Unidades: EP; EESC
- DOI: 10.1364/OE.18.016387
- Subjects: HOLOGRAMAS; ÓPTICA
- Language: Inglês
- Imprenta:
- Publisher place: Washington
- Date published: 2010
- Source:
- Título do periódico: Optics Express
- ISSN: 1094-4087
- Volume/Número/Paginação/Ano: v. 18, n. 16, p. 16387-16405, Aug. 2010
- Este periódico é de acesso aberto
- Este artigo é de acesso aberto
- URL de acesso aberto
- Cor do Acesso Aberto: gold
- Licença: cc-by
-
ABNT
CIRINO, Giuseppe Antonio et al. Diffractive phase-shift lithography photomask operating in proximity printing mode. Optics Express, v. 18, n. 16, p. 16387-16405, 2010Tradução . . Disponível em: https://doi.org/10.1364/OE.18.016387. Acesso em: 24 abr. 2024. -
APA
Cirino, G. A., Mansano, R. D., Verdonck, P. B., Cescato, L., & Gonçalves Neto, L. (2010). Diffractive phase-shift lithography photomask operating in proximity printing mode. Optics Express, 18( 16), 16387-16405. doi:10.1364/OE.18.016387 -
NLM
Cirino GA, Mansano RD, Verdonck PB, Cescato L, Gonçalves Neto L. Diffractive phase-shift lithography photomask operating in proximity printing mode [Internet]. Optics Express. 2010 ; 18( 16): 16387-16405.[citado 2024 abr. 24 ] Available from: https://doi.org/10.1364/OE.18.016387 -
Vancouver
Cirino GA, Mansano RD, Verdonck PB, Cescato L, Gonçalves Neto L. Diffractive phase-shift lithography photomask operating in proximity printing mode [Internet]. Optics Express. 2010 ; 18( 16): 16387-16405.[citado 2024 abr. 24 ] Available from: https://doi.org/10.1364/OE.18.016387 - Digital holography: computer-generated holograms and diffractive optics in scalar diffraction domain
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Informações sobre o DOI: 10.1364/OE.18.016387 (Fonte: oaDOI API)
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