Electrical and optical properties of aluminum oxide thin films produced by IBAD (2011)
- Authors:
- USP affiliated authors: CHUBACI, JOSE FERNANDO DINIZ - IF ; MATSUOKA, MASAO - IF ; WATANABE, SHIGUEO - IF ; SANTOS, THALES BORRELY DOS - IF
- Unidade: IF
- Assunto: FÍSICA ÓPTICA
- Language: Inglês
- Imprenta:
- Publisher: SBF
- Publisher place: Foz do Iguaçu
- Date published: 2011
- Source:
- Título do periódico: Resumo
- Conference titles: Econtro de Física
-
ABNT
SANTOS, Thales Borrely dos et al. Electrical and optical properties of aluminum oxide thin films produced by IBAD. 2011, Anais.. Foz do Iguaçu: SBF, 2011. Disponível em: http://www.sbf1.sbfisica.org.br/eventos/enf/2011/sys/resumos/R3276-1.pdf. Acesso em: 18 abr. 2024. -
APA
Santos, T. B. dos, Chubaci, J. F. D., Matsuoka, M., Watanabe, S., Hattori, Y., Souza, P. O. de, & Gennary, R. F. (2011). Electrical and optical properties of aluminum oxide thin films produced by IBAD. In Resumo. Foz do Iguaçu: SBF. Recuperado de http://www.sbf1.sbfisica.org.br/eventos/enf/2011/sys/resumos/R3276-1.pdf -
NLM
Santos TB dos, Chubaci JFD, Matsuoka M, Watanabe S, Hattori Y, Souza PO de, Gennary RF. Electrical and optical properties of aluminum oxide thin films produced by IBAD [Internet]. Resumo. 2011 ;[citado 2024 abr. 18 ] Available from: http://www.sbf1.sbfisica.org.br/eventos/enf/2011/sys/resumos/R3276-1.pdf -
Vancouver
Santos TB dos, Chubaci JFD, Matsuoka M, Watanabe S, Hattori Y, Souza PO de, Gennary RF. Electrical and optical properties of aluminum oxide thin films produced by IBAD [Internet]. Resumo. 2011 ;[citado 2024 abr. 18 ] Available from: http://www.sbf1.sbfisica.org.br/eventos/enf/2011/sys/resumos/R3276-1.pdf - Production and characterization of high dieletric constant oxide thin films
- The end of Moore’s Law: alumina thin films produced by ion beam assisted deposition as gate oxide
- Thermoluminescense and photoluminescence characterization of silicate glasses exposed to ionizing radiation
- Production and photoluminescence characterization of silicate glasses exposed to ionizing radiation.
- Study and characterization of thin films of CeOx produced by ion beam assited deposition
- Filmes finos de oxidos(HfO2, CeO2, TiO2) para dispositivos eletrônicos fabricados por IBAD (Ions Beam Assisted for Deposition)
- Bulk properties of InN films determined by experiments and theory
- Thin film oxides produced by IBAD (ion beam assisted deposition)
- Caracterização de filmes finos de nitreto de índio para fabricação de sensores que operam na região do IR
- Formação de filmes finos de óxidos metálicos pela técnica IBAD (Ions Beam Assisted for Deposition)
How to cite
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas