Metal-induced crystallization by homogeneous insertion of metallic species in amorphous semiconductors (2015)
- Authors:
- Autor USP: ZANATTA, ANTONIO RICARDO - IFSC
- Unidade: IFSC
- DOI: 10.1201/b18032-5
- Subjects: SEMICONDUTORES; FILMES FINOS; CRISTALIZAÇÃO
- Language: Inglês
- Imprenta:
- Source:
- Título do periódico: Metal-induced crystallization: fundamentals and applications
- Este periódico é de assinatura
- Este artigo NÃO é de acesso aberto
- Cor do Acesso Aberto: closed
-
ABNT
ZANATTA, Antonio Ricardo e FERRI, Fabio A. Metal-induced crystallization by homogeneous insertion of metallic species in amorphous semiconductors. Metal-induced crystallization: fundamentals and applications. Tradução . New York: CRC Press, 2015. . Disponível em: https://doi.org/10.1201/b18032-5. Acesso em: 27 abr. 2024. -
APA
Zanatta, A. R., & Ferri, F. A. (2015). Metal-induced crystallization by homogeneous insertion of metallic species in amorphous semiconductors. In Metal-induced crystallization: fundamentals and applications. New York: CRC Press. doi:10.1201/b18032-5 -
NLM
Zanatta AR, Ferri FA. Metal-induced crystallization by homogeneous insertion of metallic species in amorphous semiconductors [Internet]. In: Metal-induced crystallization: fundamentals and applications. New York: CRC Press; 2015. [citado 2024 abr. 27 ] Available from: https://doi.org/10.1201/b18032-5 -
Vancouver
Zanatta AR, Ferri FA. Metal-induced crystallization by homogeneous insertion of metallic species in amorphous semiconductors [Internet]. In: Metal-induced crystallization: fundamentals and applications. New York: CRC Press; 2015. [citado 2024 abr. 27 ] Available from: https://doi.org/10.1201/b18032-5 - Structural investigation of cobalt oxide films grown by reactive DC magnetron sputtering
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- Photoluminescence of Sm and Er doped amorphous AIN
- Photoelectron spectroscopic study of amoprhous GaAsN films
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- Laser-induced generation of micrometer-sized luminescent patterns on rare-earth-doped amorphous films
- Photon and electron excitation of rare-earth-doped amorphous SiN films
Informações sobre o DOI: 10.1201/b18032-5 (Fonte: oaDOI API)
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