TI - Dry etching of resist for three level resist process using statistical design of experiments PY - 1995 AU - Mansano, Ronaldo Domingues AU - Verdonck, Patrick Bernard AU - Maciel, H. S. T2 - Congress of the Brazilian Microelectronics Society J2 - Proceedings PP - Porto Alegre PB - Instituto de Informatica da Ufrgs ER -