@article{articlef0ff0126,
title   = {Metal contamination of silicon wafers induced by reactive ion etching plasmas and its behavior upon subsequent cleaning procedures},
author = {Verdonck, Patrick Bernard and Hasenack, Claus Martin and Mansano, Ronaldo Domingues},
year = {1996},
doi = {10.1116/1.588426},
journal   = {Journal of Vacuum Science and Technology B}
}