@article{articled471ce83,
title   = {Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition},
author = {Scopel, Wanderla Luis and Cuzinatto, R R and Tabacniks, Manfredo Harri and Fantini, Márcia Carvalho de Abreu and Alayo Chávez, Marco Isaías and Pereyra, Inés},
year = {2001},
doi = {10.1016/s0022-3093(01)00608-1},
journal   = {Journal of Non-Crystalline Solids}
}